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SUPREM-III进行集成电路氧化—扩散工艺模拟
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2009-06-19
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随着集成电路工艺的不断发展，工艺模拟软件功能也在不断的改善，本文以氧化扩散工艺为例,并在计算机上采用SUPREM-III 完成氧化扩散初始条件的编辑以及工艺模拟，并对模拟结果进行分析比较。从而对氧化、扩散工艺操作过程有直观的了解，避免了复杂的
工程计算。
关键词 SUPREM-III; 氧化扩散; 工艺模拟
Abstract With the rapid development in the process of intenrated circuits, the function of the
process simulation software has been improved constantly, Taking The oxidation and diffusion process as example, The edit of process initial condition and oxygen chemical diffusion process simulation are done on the computer. The simulation curves are also compared. and the oxidation and diffusion process can be easily seen while avoiding the complicated engineering computation.
Key words: SUPREM-III ; oxygen chemical diffusion ; process simulation
工程计算。
关键词 SUPREM-III; 氧化扩散; 工艺模拟
Abstract With the rapid development in the process of intenrated circuits, the function of the
process simulation software has been improved constantly, Taking The oxidation and diffusion process as example, The edit of process initial condition and oxygen chemical diffusion process simulation are done on the computer. The simulation curves are also compared. and the oxidation and diffusion process can be easily seen while avoiding the complicated engineering computation.
Key words: SUPREM-III ; oxygen chemical diffusion ; process simulation
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