资料下载
×
基于VC＋＋6.0的电子束曝光控制系统
消耗积分:3 |
格式:rar |
大小:201 |
2009-06-29
张丽
分享资料个
随着纳米科技的迅速发展，下一代光刻技术在微细加工领域发挥着日益重要的作用。
作为复杂半导体加工主要手段之一的电子束曝光系统，需要稳定完善的控制软件来保证其正常运行。本文介绍了电子束曝光控制系统的设计原理，并着重介绍了其对电子束曝光的全过程进行控制的强大功能。
关键词：电子束曝光控制系统绘制图形
Abstract: With the quick development of nanoscience and nanotechnology, Next Generation
Lithography has played more and more important role in the field of micro-fabrication. As one
of the complicated semiconductor machining equipments, electron beam lithography system needs steady control software system to ensure that it can run correctly. In this paper, the fundamental theories of the newly developed control system for electron beam lithography are introduced. Furthermore, the robust control of the whole process from creating exposure files until the final exposure is discussed in particular.
Key Word: Electron beam Lithography, Control system, Draw graphics
作为复杂半导体加工主要手段之一的电子束曝光系统，需要稳定完善的控制软件来保证其正常运行。本文介绍了电子束曝光控制系统的设计原理，并着重介绍了其对电子束曝光的全过程进行控制的强大功能。
关键词：电子束曝光控制系统绘制图形
Abstract: With the quick development of nanoscience and nanotechnology, Next Generation
Lithography has played more and more important role in the field of micro-fabrication. As one
of the complicated semiconductor machining equipments, electron beam lithography system needs steady control software system to ensure that it can run correctly. In this paper, the fundamental theories of the newly developed control system for electron beam lithography are introduced. Furthermore, the robust control of the whole process from creating exposure files until the final exposure is discussed in particular.
Key Word: Electron beam Lithography, Control system, Draw graphics
声明：本文内容及配图由入驻作者撰写或者入驻合作网站授权转载。文章观点仅代表作者本人，不代表电子发烧友网立场。文章及其配图仅供工程师学习之用，如有内容侵权或者其他违规问题，请联系本站处理。 举报投诉
评论(0)
发评论
- 相关下载
- 相关文章
