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干刻清洗工艺在金属刻蚀去胶腔上的评价及应用
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2009-12-14
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本文以金属刻蚀去胶腔为背景，简述干刻清洗工艺开发和评价过程。针对实际应用中
的问题，展开讨论。通过实际案例分析,展示了干刻清洗工艺的应用价值。
关键字：干刻清洗Dry Clean； 金属刻蚀 Metal Etch；干刻 Dry Etch；
去胶腔 Ash Chamber；去胶速率：Ash Rate (AR)
The Evaluation And Application Of Dry Clean Process On Ash Chamber Of Metal Etch
Wang Qian (Shanghai Jiao Tong University)
(Shanghai Huahong NEC Electronics Limited Company, Shanghai 201206, China)
Abstract: Based on ash chamber of metal etch, this paper describes the full process of dry clean
development and evaluation. And the related issue among process application is also discussed.
Through the analysis of actual case, the worth of dry clean application is presented.
的问题，展开讨论。通过实际案例分析,展示了干刻清洗工艺的应用价值。
关键字：干刻清洗Dry Clean； 金属刻蚀 Metal Etch；干刻 Dry Etch；
去胶腔 Ash Chamber；去胶速率：Ash Rate (AR)
The Evaluation And Application Of Dry Clean Process On Ash Chamber Of Metal Etch
Wang Qian (Shanghai Jiao Tong University)
(Shanghai Huahong NEC Electronics Limited Company, Shanghai 201206, China)
Abstract: Based on ash chamber of metal etch, this paper describes the full process of dry clean
development and evaluation. And the related issue among process application is also discussed.
Through the analysis of actual case, the worth of dry clean application is presented.
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